Transport of nano-particles in capacitively coupled rf discharges without and with amplitude modulation of discharge voltage : Plasma-aided fabrication of nanostructures and nanoassembliesKOGA, Kazunori; IWASHITA, Shinya; SHIRATANI, Masaharu et al.Journal of physics. D, Applied physics (Print). 2007, Vol 40, Num 8, pp 2267-2271, issn 0022-3727, 5 p.Article

Nucleation and subsequent growth of clusters in reactive plasmasWATANABE, Yukio; SHIRATANI, Masaharu; KOGA, Kazunori et al.Plasma sources science & technology (Print). 2002, Vol 11, Num 3A, pp A229-A233, issn 0963-0252Article

X-Ray photoelectron spectroscopy analysis of plasma-polymer interactions for development of low-damage plasma processing of soft materialsSETSUHARA, Yuichi; CHO, Ken; SHIRATANI, Masaharu et al.Thin solid films. 2010, Vol 518, Num 22, pp 6492-6495, issn 0040-6090, 4 p.Article

Analysis on the Photovoltaic Property of Si Quantum Dot-Sensitized Solar CellsHYUNWOONG SEO; ICHIDA, Daiki; UCHIDA, Giichiro et al.International journal of precision engineering and manufacturing. 2014, Vol 15, Num 2, pp 339-343, 5 p.Article

The reduction of charge recombination and performance enhancement by the surface modification of Si quantum dot-sensitized solar cellSEO, Hyunwoong; YUTING WANG; UCHIDA, Giichiro et al.Electrochimica acta. 2013, Vol 87, pp 213-217, issn 0013-4686, 5 p.Article

Nano-factories in plasma: present status and outlookSHIRATANI, Masaharu; KOGA, Kazunori; IWASHITA, Shinya et al.Journal of physics. D, Applied physics (Print). 2011, Vol 44, Num 17, issn 0022-3727, 174038.1-174038.8Article

Advanced research and development for plasma processing of polymers with combinatorial plasma-process analyzerSETSUHARA, Yuichi; CHO, Ken; TAKENAKA, Kosuke et al.Thin solid films. 2010, Vol 518, Num 22, pp 6320-6324, issn 0040-6090, 5 p.Article

Investigation of chemical bonding states at interface of Zn/organic materials for analysis of early stage of inorganic/organic hybrid multi―layer formationCHO, Ken; TAKENAKA, Kosuke; SETSUHARA, Yuichi et al.Thin solid films. 2012, Vol 523, pp 15-19, issn 0040-6090, 5 p.Conference Paper

Effects of crystalline nanoparticle incorporation on growth, structure, and properties of microcrystalline silicon films deposited by plasma chemical vapor depositionKIM, Yeonwon; MATSUNAGA, Takeaki; NAKAHARA, Kenta et al.Thin solid films. 2012, Vol 523, pp 29-33, issn 0040-6090, 5 p.Conference Paper

Control of radial density profile of nano-particles produced in reactive plasma by amplitude modulation of radio frequency discharge voltageKAMATAKI, Kunihiro; KOGA, Kazunori; UCHIDA, Giichiro et al.Thin solid films. 2012, Vol 523, pp 76-79, issn 0040-6090, 4 p.Conference Paper

Discharge power dependence of H_α intensity and electron density of Ar+H₂ discharges in H-assisted plasma CVD reactorUMETSU, Jun; KOGA, Kazunori; INOUE, Kazuhiko et al.Surface & coatings technology. 2008, Vol 202, Num 22-23, pp 5659-5662, issn 0257-8972, 4 p.Conference Paper

The 24^th Symposium on Plasma Science for MaterialsSETSUHARA, Yuichi; SHIRATANI, Masaharu; KANEKO, Toshiro et al.Thin solid films. 2012, Vol 523, issn 0040-6090, 81 p.Conference Proceedings

The changes in particle charge distribution during rapid growth of particles in the plasma reactorKIM, Kyo-Seon; KIM, Dong-Joo; YOON, Jong-Hwan et al.Journal of colloid and interface science. 2003, Vol 257, Num 2, pp 195-207, issn 0021-9797, 13 p.Article

The enhancement of dye adsorption in dye-sensitized solar module by an electrical adsorption methodHYUNWOONG SEO; SON, Min-Kyu; KIM, Hee-Je et al.Thin solid films. 2014, Vol 554, pp 118-121, issn 0040-6090, 4 p.Conference Paper

Cluster-suppressed plasma CVD for deposition of high quality a-Si:H filmsSHIRATANI, Masaharu; KOGA, Kazunori; WATANABE, Yukio et al.Thin solid films. 2003, Vol 427, Num 1-2, pp 1-5, issn 0040-6090, 5 p.Conference Paper

Two-Dimensional Spatial Profile of Volume Fraction of Nanoparticles Incorporated Into a-Si:H Films Deposited by Plasma CVDNAKAMURA, William Makoto; MIYAHARA, Hiroomi; SATO, Hiroshi et al.IEEE transactions on plasma science. 2008, Vol 36, Num 4, pp 888-889, issn 0093-3813, 2 p., 1Article

Transport control of dust particles via the electrical asymmetry effect: experiment, simulation and modellingIWASHITA, Shinya; SCHÜNGEL, Edmund; SCHULZE, Julian et al.Journal of physics. D, Applied physics (Print). 2013, Vol 46, Num 24, issn 0022-3727, 245202.1-245202.12Article

Development of density-inclination plasmas for analysis of plasma nano-processes via combinatorial methodSETSUHARA, Yuichi; NAGAO, Katsuhisa; SHIRATANI, Masaharu et al.Thin solid films. 2009, Vol 518, Num 3, pp 1020-1023, issn 0040-6090, 4 p.Conference Paper

Sheath-to-sheath transport of dust particles in a capacitively coupled dischargeIWASHITA, Shinya; UCHIDA, Giichiro; SCHULZE, Julian et al.Plasma sources science & technology (Print). 2012, Vol 21, Num 3, issn 0963-0252, 032001.1-032001.5Article

Combinatorial analyses of plasma―polymer interactionsSETSUHARA, Yuichi; CHO, Ken; TAKENAKA, Kosuke et al.Surface & coatings technology. 2011, Vol 205, issn 0257-8972, S484-S489, SUP2Conference Paper

Carbon particle formation due to interaction between H₂ plasma and carbon fiber composite wallKOGA, Kazunori; UEHARA, Ryuji; KITAURA, Yasuhiro et al.IEEE transactions on plasma science. 2004, Vol 32, Num 2, pp 405-409, issn 0093-3813, 5 p., 1Conference Paper

Carbon nitride deposition onto steel substrates by radio frequency plasma assisted pulsed laser deposition with substrate heatingYASUI, Toshiaki; KIMURA, Shingo; NISHIKAWA, Ryutaro et al.Thin solid films. 2012, Vol 523, pp 20-24, issn 0040-6090, 5 p.Conference Paper

Development of sterilization device using air nonthermal plasma jet induced by atmospheric pressure corona dischargeKUWAHARA, Takuya; KUROKI, Tomoyuki; YOSHIDA, Keiichiro et al.Thin solid films. 2012, Vol 523, pp 2-5, issn 0040-6090, 4 p.Conference Paper

Discharge and optical characteristics of long arc plasma of direct current dischargeTIANMING LI; CHOI, Sooseok; WATANABE, Takayuki et al.Thin solid films. 2012, Vol 523, pp 72-75, issn 0040-6090, 4 p.Conference Paper

Magnetically driven rotation of thermal plasma jet for non-degradable CF₄ treatmentCHOI, Sooseok; SANG HEE HONG; KIM, Sungwoo et al.Thin solid films. 2012, Vol 523, pp 55-62, issn 0040-6090, 8 p.Conference Paper